Semiconductor & Advanced Materials
Research-grade sputtering targets, single-crystal substrates, epitaxial wafers and high-purity powders, specified to the properties your experiment depends on.
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Diamond Abrasive Powder
Abrasive powder for lapping and polishing of substrates and hard materials.
Fe-doped Ga₂O₃ (010) Substrate
Iron-doped gallium oxide substrate, (010) orientation.
Ga₂O₃ Epitaxial Wafer
Epitaxial gallium-oxide layer on substrate — distinct from the bare substrate above.
Ga₂O₃ Single-Crystal Substrate
Substrate for epitaxial growth and device research on gallium oxide.
High-Purity Ga₂O₃ Powder
High-purity gallium oxide powder for research use.
High-Purity IrO₂ Powder
High-purity iridium oxide powder for research use.
High-Purity La₂O₃ Powder
High-purity lanthanum oxide powder for research use.
High-Purity MnO₂ Powder
High-purity manganese dioxide powder for research use.
High-Purity SrCO₃ Powder
High-purity strontium carbonate powder for research use.
Metal Sputtering Targets
Pure-metal targets for thin-film deposition (e.g. Al, Ti, Cu, Ni, Ag).
MgAl₂O₄ (001) Substrate
Spinel substrate, (001) orientation, for epitaxial growth.
MgO (001) Substrate
Magnesium oxide substrate, (001) orientation, for epitaxial growth.
Nb:SrTiO₃ (001) Substrate
Nb-doped strontium titanate substrate, (001) orientation, for oxide epitaxy.
Nitride & Carbide Sputtering Targets
Compound targets for thin-film deposition (e.g. TiN, SiC and related nitrides/carbides).
Oxide Sputtering Targets
Oxide-compound targets for thin-film deposition (e.g. ITO, ZnO, SiO₂, Al₂O₃).
SiC Wafer Substrate
Silicon carbide wafer substrate for epitaxy and device research.
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